Research associate, University of glasgow, United Kingdom
Sameh Okasha is a dedicated Research Associate at the University of Glasgow, UK, with extensive experience in semiconductor processing and nanotechnology. His work spans both academia and industry, where he has contributed to cutting-edge research in multi-modal electron microscopy and semiconductor film development. Sameh is passionate about advancing material science and engineering, with a focus on innovative process solutions and quality assurance in high-tech environments.
Publication Profile
Education 🎓
Sameh Okasha earned his Ph.D. in Molecular and Material Science from Kyushu University, Japan (2018-2021), where he researched atomic layer deposition of nanoscale aluminum superconducting materials. He also holds a Master’s degree in the same field from Kyushu University (2016-2018), focusing on the fabrication, synthesis, and catalytic activity of metal oxide nanowires decorated with nanoparticles. His academic journey began with a Bachelor’s degree in Chemical Engineering from Cairo University, Egypt (2007-2012), where he excelled with distinction.
Experience 💼
Sameh’s career includes roles as a Research Associate at the University of Glasgow, where he explores multi-modal electron microscopy of 3D racetrack memory. He previously worked as a Process Engineer II at ASM Japan (2021-2023), where he developed semiconductor SiO2 films and addressed critical process challenges. Earlier in his career, he served as a Quality Control & Quality Assurance Engineer at Gulsan Holding, Egypt, where he played a pivotal role in establishing a state-of-the-art laboratory and led a team of technicians in ensuring quality control for Procter & Gamble.
Research Focus 🔬
Sameh’s research focuses on material science, particularly in semiconductor processing and nanotechnology. He has worked extensively on the atomic layer deposition of superconducting materials, the synthesis of metal oxide nanowires, and advanced imaging techniques like electron microscopy. His work aims to solve critical problems in semiconductor device fabrication and optimize processes for high-quality film deposition.
Awards and Honours 🏆
Sameh has received several awards for his contributions to material science and engineering. He was honored with the Inventor’s Award by ASM Japan in May 2023. He has also received multiple appreciation certificates from Kyushu University for his participation in international conferences. Notably, he won the Nano Initiative Munich (NIM) student research award during his research internship at Ludwig-Maximillian’s-Universitat Munchen, Germany, in 2017.
Publication Top Notes 📚
- “Characterization of alane (AlH₃) thin films grown by atomic layer deposition for hydrogen storage applications” | Applied Surface Science | 2024-11
- “Atomic layer deposition of self-assembled aluminum nanoparticles using dimethylethylamine alane as precursor and trimethylaluminum as an initiator” | Journal of Nanoparticle Research | 2022-12
- “Atomic layer deposition of aluminum (111) thin film by dimethylethylaminealane precursor” | Thin Solid Films | 2021-08
- “nZVI@TiO₂ Hetero-interface Activity for NO₃⁻ Removal as Water Remediation Application” | Conference Paper | 2018-10-18
- “Hetero-interface of CeO₂ Nanoparticles Single Crystal On MgO Nanowires Surface” | Conference Paper | 2017-10-19
Conclusion:
Sameh Okasha is a highly qualified candidate for the Research for Best Researcher Award, with a solid foundation in material science, nanotechnology, and semiconductor processing. His technical expertise, international research experience, and recognition through awards make him a strong contender. However, to maximize his chances, it would be beneficial to highlight his publication record more prominently and to showcase broader collaborations and outreach activities. Overall, his profile is well-aligned with the award’s criteria, and with a few enhancements, he would be an excellent candidate for this prestigious recognition.